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我們的計量工具可以測量 N2 半導體工藝多層 GAA 結構並以原子級分辨率監控關鍵尺寸。 與競爭對手相比,該工具減少了 90% 的測量時間。 目標市場包括半導體 N2 節點以下的代工廠和存儲器。

Our metrology tool can measure the N2 semiconductor process multilayer GAA structure and monitor critical dimensions with atomic-level resolution. Compared with its competitors, the tool has reduced measurement time by 90%. The target market includes foundry and memory below semiconductor N2 node.